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High-Purity Silicon Tetrachloride: The "Crystalline" Foundation of Semiconductor and Optical Fiber Manufacturing

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99.9999% Purity, Defining a New Standard for Electronic-Grade Materials

In cutting-edge fields such as chip manufacturing and optical fiber preform synthesis, the purity of materials directly determines the performance limits of products. IOTA High-Purity Silicon Tetrachloride (TET), with its ≥99.9999% ultra-high purity and ≥500 Ω·cm resistivity performance, provides safe, reliable, and consistent high-quality raw material assurance for critical processes such as semiconductor deposition and optical fiber core layer preparation.


Why Choose IOTA High-Purity Silicon Tetrachloride?

 Ultimate Purity, Reliable Performance

  • Purity ≥99.9999% (6N grade), meeting stringent requirements for impurity control in advanced processes

  • Extremely low levels of key impurities: B ≤ 0.1 ppb, As/P ≤ 0.08 ppb, C < 0.2 ppb

  • Resistivity ≥500 Ω·cm, ensuring consistency in the electrical properties of deposited films

 Strict Control of Metal Impurities

  • Transition metal impurities such as Fe, Ni, and Cr are controlled at ppb levels

  • Effectively reduces lattice defects, improving device yield and reliability

Professional Packaging, Safe Delivery

  • Uses high-purity 316L stainless steel containers to prevent secondary contamination

  • Available in 45L, 250L, and 900L specifications, corresponding to fill weights of 45kg, 300kg, and 1000kg

  • Standard valves include 1/2" and 1/4" VCR interfaces, compatible with mainstream delivery systems. Custom packaging and interface solutions are available upon request


Key Specifications Overview

Parameter Specification
Purity ≥99.9999%
Resistivity ≥500 Ω·cm
Other Chlorosilanes <1 ppm
Boron (B) ≤0.1 ppb
Arsenic/Phosphorus (As/P) ≤0.08 ppb
Carbon (C) <0.2 ppb
Iron (Fe) <2 ppb
Nickel (Ni) ≤2 ppb
Chromium (Cr) ≤1 ppb

Core Application Areas

 Semiconductor Manufacturing

  • Silicon source for epitaxial deposition (Epitaxy)

  • Precursor for chemical vapor deposition (CVD)

  • Raw material for high-purity polysilicon production

 Optical Fiber Communications

  • Synthesis of optical fiber preform core layers

  • Production of doped quartz glass

 Specialty Material Synthesis

  • Vapor deposition of high-purity silicon dioxide

  • Synthesis of specialty ceramics and precursors

  • Supporting materials for photovoltaics and electronic specialty gases


Packaging and Supply Assurance

  • Container Material: 316L stainless steel, electrolytically polished (EP grade) inner surface, ultra-high cleanliness

  • Specification Options:

    • 45L cylinder → filled with 45kg

    • 250L cylinder → filled with 300kg

    • 900L cylinder → filled with 1000kg

  • Valve Configuration: 1/2" and 1/4" VCR interfaces, compatible with helium mass spectrometry leak detection

  • Custom Services: Tailored packaging, valve, and delivery solutions available based on process requirements

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